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PMID: 16755055 Published · ppublish English Journal Article

Numerical simulation of film coating process in a novel rotating fluidized bed.

Chemical & pharmaceutical bulletin ·Vol. 54 ·No. 6 ·2006-06-00 ·页码 839-46

Nakamura H, Iwasaki T, Watano S

Abstract

In this study, numerical simulation of film coating process in a novel rotating fluidized bed (RFB) was conducted by using a Discrete Element Method (DEM)-Computational Fluid Dynamics (CFD) coupling model. Particle movements and fluid motions in a centrifugal force field were simulated at three-dimensional cylindrical coordinate, and this model was applied to film coating process. Film coating process in a RFB was numerically analyzed by using a simplified assumption that a particle was coated only when a particle existed within a spray zone. The experiments were also conducted and uniformity of sprayed material was evaluated by investigating color difference of the coated particles. As a result of the numerical simulation, three-dimensional bubble movements and particle circulation could be well simulated. In addition, mass of the sprayed material on a single particle in a RFB could be visualized by using our proposed model. The relationship between distribution of the sprayed material and the coating time was also analyzed. Calculated mass distributions of the sprayed material could be expressed by a normal distribution function, showing qualitative good agreement with the previous studies. Effect of the operating parameters, such as gas velocity and centrifugal acceleration, on the uniformity of the sprayed material was also investigated by both numerical and experimental approaches. Comparison of the coating process in a RFB with that in a conventional fluidized bed was also conducted by the numerical simulation. The result showed that uniformity of the sprayed material was greatly improved in a RFB due to the much smaller circulation time.

MeSH 主题词
Chemistry, Pharmaceutical Computer Simulation Dosage Forms Excipients/administration & dosage,chemistry Models, Chemical Particle Size Rotation Solubility Technology, Pharmaceutical
化学物质
Dosage Forms Excipients
作者与单位
共 3 位作者,点击展开单位 / ORCID
Nakamura Hideya
Department of Chemical Engineering, Osaka Prefecture University, Sakai, Osaka 599-8531, Japan.
Iwasaki Tomohiro
Watano Satoru
Article Info
Journal
Chemical & pharmaceutical bulletin
Abbr.
Chem Pharm Bull (Tokyo)
ISSN
1347-5223
Published
2006-06-00
页码
839-46
Language
English
Country/Region
Japan
NLM ID
0377775
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