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PMID: 422673 Published · ppublish English Journal Article Research Support, U.S. Gov't, P.H.S.

Plasma membrane vesiculation in 3T3 and SV3T3 cells. II. Factors affecting the process of vesiculation.

Journal of cell science ·Vol. 35 ·1979-02-00 ·Pages 245-52

Scott RE, Maercklein PB

Abstract

Plasma membrane vesicles are shed from monolayer cell cultures during incubation in low concentrations of formaldehyde and other sulphydryl blocking reagents. In both 3T3 and SV3T3 cells disulphide reducing agents, including dithiothreitol and mercaptoethanol, potentiate formaldehyde-induced vesiculation. Plasma membrane vesiculation is shown to be a temperature-dependent phenomenon which occurs optimally between 22 and 37 degrees C and at pH 7.0 to 7.5. Membrane shedding is an energy-dependent phenomenon, requiring monovalent and divalent cations and slightly hypertonic medium. Plasma membrane vesiculation is not affected by pretreatment of cells with inhibitors of protein synthesis, i.e. cycloheximide, nor by agents which disrupt the cytoskeleton.

MeSH Terms
Antimetabolites/pharmacology Cell Line Cell Membrane/drug effects,ultrastructure Cell Transformation, Viral Culture Media Disulfides/pharmacology Osmolar Concentration Temperature
Chemicals
Antimetabolites Culture Media Disulfides
Authors & Affiliations
2 authors, click to expand affiliations / ORCID
Scott R E
Maercklein P B
Article Info
Journal
Journal of cell science
Abbr.
J Cell Sci
ISSN
0021-9533
Published
1979-02-00
Pages
245-52
Language
English
Region
England
NLM ID
0052457
Subset
IM
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